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This breakthrough in wafer-scale growth of monolayer MoSi₂N₄ single crystals addresses a critical bottleneck for scaling two-dimensional semiconductors beyond current silicon limitations. By achieving superior carrier mobility and thermal conductivity compared to MoS₂, the research provides a viable pathway toward high-performance complementary metal-oxide-semiconductor (CMOS) integrated circuits based on 2D materials.
Scientists Grow P-Type Semiconductor as Single Crystal Film
Scientists led by Prof. REN Wencai from the Institute of Metal Research (IMR) of the Chinese Academy of Sciences achieved wafer-scale epitaxial growth of monolayer MoSi 2 N 4 single crystals, a high-performance p-type two-dimensional (2D) semiconductor. Published on July 8 in Nature Materials, their findings represent a step toward complementary metal-oxide-semiconductor (CMOS) integrated circuits based on 2D materials.
Published on July 8 in Nature Materials, researchers led by Professor REN Wencai from the Institute of Metal Research of the Chinese Academy of Sciences report achieving wafer-scale growth of monolayer MoSi₂N₄…
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