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This research presents a scalable, deterministic method for integrating silicon carbide color centers into nanophotonic structures, significantly boosting photon count rates while maintaining spin coherence essential for quantum networks. By using a unified nanoscale mask for implantation and etching, the technique overcomes low-yield limitations that previously hindered practical quantum communication devices. The approach offers a viable pathway to deploy solid-state quantum emitters at scales comparable to bulk samples, advancing the hardware infrastructure for future quantum internet applications.
Scalable integration of silicon carbide color centers into nanophotonic structures
arXiv:2609.27601v1 Announce Type: new Abstract: Color centers in silicon carbide are a promising platform for quantum technologies, offering long-coherence electron and nuclear spins for storing and manipulating quantum information, as well as single-photon emission for quantum communication. Low photon collection efficiency is commonly addressed by integrating color centers into nanophotonic devices. Here, we report a scalable method for the deterministic integration of color centers into silicon carbide nanopillars, using the same nanoscale mask for both implantation of oxygen-related color centers (PL5, PL6) and subsequent nanopillar fabrication via dry etching. This approach solves the issue of low color center creation yield in nanostructures, with figures of merit comparable to bulk samples. We demonstrate count rate enhancements of up to one order of magnitude for PL5 and four times for PL6, while preserving spin coherence times. Our method is directly applicable to other solid-state platforms, offering a scalable route to efficiently integrate color centers into nanostructures.
Abstract:Color centers in silicon carbide are a promising platform for quantum technologies, offering long-coherence electron and nuclear spins for storing and manipulating quantum information, as well as single-photon emission for quantum communication. Low photon collection efficiency is commonly addressed by integrating color centers into nanophotonic devices. Here, we report a scalable method for the deterministic integration of color centers into silicon carbide nanopillars, using the same nanoscale mask for both implantation of oxygen-related color centers (PL5, PL6) and subsequent nanopillar fabrication via dry etching. This approach solves the issue of low color center creation yield in nanostructures, with figures of merit comparable to bulk samples. We demonstrate count rate enhancements of up to one order of magnitude for PL5 and four times for PL6, while preserving spin coherence times. Our method is directly applicable to other solid-state platforms, offering a scalable route to efficiently integrate color centers into nanostructures.
arXiv:2609.27601 [quant-ph]
(or arXiv:2609.27601v1 [quant-ph] for this version)
https://doi.org/10.48550/arXiv.2609.27601 Focus to learn more arXiv-issued DOI via DataCite (pending registration)
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Full text under the publisher's open licence · 240 words
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