Skip to content
aiqbench takeMachine Learning

aiqbench analysis

This research applies physics-informed neural operators to accelerate 3-D electromagnetic scattering simulations for EUV lithography, directly addressing computational bottlenecks in semiconductor manufacturing. By training the model on mask designs without precomputed solutions and using it as a warm-start initializer, the study demonstrates how AI can significantly reduce simulation costs while maintaining high accuracy against reference solvers.
Source coveringarXiv
What this isA model's reading of the article and related coverage, written for aiqbench. Not the publisher's words.

Physics-Informed Neural Operator for Warm-Starting Background-Decomposed and Preconditioned PSFD: Enabling Scalable 3-D EUV Mask Simulation

arXiv2 min read

arXiv:2607.25330v1 Announce Type: cross Abstract: We present a physics-informed neural operator (PINO) trained with pseudo-spectral frequency-domain (PSFD) equations for electromagnetic (EM) scattering problems in EUV lithography. The Fourier neural operator is factorized into a two-dimensional lateral ($xy$) branch and a one-dimensional axial ($z$) branch and is trained self-consistently with background decomposition.Thus, the full-vector coupling between the mask and the multilayer response is retained without invoking a finite-order Born approximation. In this way, the computational domain size is significantly reduced, thereby lowering the computational cost. The PINO is trained on approximately 16,000 mask designs from the LithoBench library sampled randomly at each training iteration without using precomputed EM field solutions. The PINO surrogate model yields predictions with a mean absolute error of about $7 \times 10^{-3}$ for the scattered intensity of held-out mask patterns relative to the reference PSFD solution. Combined with spectral damping, the PINO warm-start initialization accelerates the background-decomposed PSFD solver on finer discretizations.

Abstract:We present a physics-informed neural operator (PINO) trained with pseudo-spectral frequency-domain (PSFD) equations for electromagnetic (EM) scattering problems in EUV lithography. The Fourier neural operator is factorized into a two-dimensional lateral ($xy$) branch and a one-dimensional axial ($z$) branch and is trained self-consistently with background this http URL, the full-vector coupling between the mask and the multilayer response is retained without invoking a finite-order Born approximation. In this way, the computational domain size is significantly reduced, thereby lowering the computational cost. The PINO is trained on approximately 16,000 mask designs from the LithoBench library sampled randomly at each training iteration without using precomputed EM field solutions. The PINO surrogate model yields predictions with a mean absolute error of about $7 \times 10^{-3}$ for the scattered intensity of held-out mask patterns relative to the reference PSFD solution. Combined with spectral damping, the PINO warm-start initialization accelerates the background-decomposed PSFD solver on finer discretizations.

Optics (physics.optics); Artificial Intelligence (cs.AI); Machine Learning (cs.LG); Applied Physics (physics.app-ph)

arXiv:2607.25330 [physics.optics]

(or arXiv:2607.25330v1 [physics.optics] for this version)

https://doi.org/10.48550/arXiv.2607.25330 Focus to learn more arXiv-issued DOI via DataCite (pending registration)

arXivLabs is a framework that allows collaborators to develop and share new arXiv features directly on our website.

Both individuals and organizations that work with arXivLabs have embraced and accepted our values of openness, community, excellence, and user data privacy. arXiv is committed to these values and only works with partners that adhere to them.

Have an idea for a project that will add value for arXiv's community? Learn more about arXivLabs.

Full text under the publisher's open licence · 254 words

Related coverage