Skip to content
aiqbench takeQuantum Computing

aiqbench analysis

This study presents a high-precision method for mapping electron g-factors and valley states in Si/SiGe quantum wells using conveyor-mode shuttling. By correlating these measurements with intervalley coupling parameters, the research provides critical benchmarks for engineering large-scale silicon spin qubit chips. These insights are essential for optimizing material heterostructures to manage spin-valley dynamics during qubit manipulation and readout operations.
Source coveringarXiv
What this isA model's reading of the article and related coverage, written for aiqbench. Not the publisher's words.

Mapping g-factors and complex intervalley coupling in Si/SiGe by conveyor-mode shuttling

arXiv2 min read

arXiv:2603.01844v3 Announce Type: replace Abstract: As silicon spin qubit chips are increasing in qubit number and area, methods for the screening of qubit related material parameters become vital. Here we demonstrate the two-dimensional mapping of small variations of the electron g-factor of quantum dots formed in planar Si/SiGe quantum wells with precision better than $10^{-3}$ and with nanometer lateral resolution. We scan the electron g-factor across a 40 nm $\times$ 400 nm area and observe two g-factors per QD site which obey a striking symmetry and bimodal distribution across the area. These two g-factors relate to valley states of the electron in the quantum dot in agreement with a recent theoretical model. Using conveyor-belt shuttling of entangled electron spin pairs, complementary to the mapping of the local valley-splitting, we map the g-factor. We compare g-factor and valley splitting maps measured on the same device, and extract the complex intervalley coupling parameter along the shuttle trajectories applying a theoretical model of g-factor dependence on intervalley coupling. These maps will allow unprecedented insights into the spin-valley dynamics during qubit manipulation, readout and shuttling and serve as a benchmark for the engineering of Si/SiGe heterostructures for large-scale quantum chips.

Abstract:As silicon spin qubit chips are increasing in qubit number and area, methods for the screening of qubit related material parameters become vital. Here we demonstrate the two-dimensional mapping of small variations of the electron g-factor of quantum dots formed in planar Si/SiGe quantum wells with precision better than $10^{-3}$ and with nanometer lateral resolution. We scan the electron g-factor across a 40 nm $\times$ 400 nm area and observe two g-factors per QD site which obey a striking symmetry and bimodal distribution across the area. These two g-factors relate to valley states of the electron in the quantum dot in agreement with a recent theoretical model. Using conveyor-belt shuttling of entangled electron spin pairs, complementary to the mapping of the local valley-splitting, we map the g-factor. We compare g-factor and valley splitting maps measured on the same device, and extract the complex intervalley coupling parameter along the shuttle trajectories applying a theoretical model of g-factor dependence on intervalley coupling. These maps will allow unprecedented insights into the spin-valley dynamics during qubit manipulation, readout and shuttling and serve as a benchmark for the engineering of Si/SiGe heterostructures for large-scale quantum chips.

Quantum Physics (quant-ph); Materials Science (cond-mat.mtrl-sci)

arXiv:2603.01844 [quant-ph]

(or arXiv:2603.01844v3 [quant-ph] for this version)

Full text under the publisher's open licence · 205 words

Related coverage