Off-topic for aiqbench
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IGZO chips patterned with a dry method reach 1-micron features
Researchers achieved 1-micron features in IGZO thin films using a dry, resist-free stencil lithography method.
Chenxiang Zhang and colleagues have achieved 1-micron features in indium-gallium-zinc oxide (IGZO) thin films using a dry patterning method. The team employed silicon nitride membrane…
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