aiqbench analysis
This research addresses the critical challenge of open-set anomaly detection in semiconductor manufacturing by fusing patch-based student-teacher networks with denoising diffusion models. The study demonstrates that hybridizing these distinct mechanisms significantly reduces misclassifications compared to single-mechanism detectors, offering a robust solution for yield loss analysis where only normal samples are available during training.
Efficient Patch-Based Anomaly Detection Fused with Diffusion Driven Generative Modeling for Semiconductor Wafer Bin Map Open Set Anomaly Detection
arXiv:2610.09993v1 Announce Type: new Abstract: Spatial defect signatures on wafer bin maps (WBMs) trace yield loss to specific process faults, yet supervised classifiers recognize only the defect types seen during training, and one-class detectors built on a single mechanism tend to capture either local structural deviations or global distributional violations, but rarely both. This work proposes a hybrid one-class framework that couples a patch-based student-teacher detector (EfficientAD) with a denoising diffusion probabilistic model (DDPM) used for partial-diffusion reconstruction, and fuses their percentile-calibrated scores through a fixed convex combination. Trained on only 700 normal wafers from the WM-38K mixed-type dataset and evaluated on 18,658 held-out wafers, the fused detector reached an AUROC of 0.9985 and reduced misclassifications from 852 (DDPM) and 1,412 (EfficientAD) to 618, with all pairwise differences significant at p < 0.001. Beyond aggregate accuracy, the analysis shows that the gain arises from weakly overlapping errors between the two modules, yet fixed-weight fusion recovers only 40-70% of the correction available to an oracle selector. Under the benchmark's inverted class balance, average precision and F1 saturate, while the Matthews correlation coefficient and negative predictive value expose unreliable normal predictions. Pixel-level maps further show that strong image-level separability does not imply spatial localization, and the diffusion module succeeds as a local density prior rather than through global geometric reasoning. These findings motivate sample-adaptive fusion and imbalance-aware evaluation of hybrid wafer anomaly detectors.
Abstract:Spatial defect signatures on wafer bin maps (WBMs) trace yield loss to specific process faults, yet supervised classifiers recognize only the defect types seen during training, and one-class detectors built on a single mechanism tend to capture either local structural deviations or global distributional violations, but rarely both. This work proposes a hybrid one-class framework that couples a patch-based student-teacher detector (EfficientAD) with a denoising diffusion probabilistic model (DDPM) used for partial-diffusion reconstruction, and fuses their percentile-calibrated scores through a fixed convex combination. Trained on only 700 normal wafers from the WM-38K mixed-type dataset and evaluated on 18,658 held-out wafers, the fused detector reached an AUROC of 0.9985 and reduced misclassifications from 852 (DDPM) and 1,412 (EfficientAD) to 618, with all pairwise differences significant at p < 0.001. Beyond aggregate accuracy, the analysis shows that the gain arises from weakly overlapping errors between the two modules, yet fixed-weight fusion recovers only 40-70% of the correction available to an oracle selector. Under the benchmark's inverted class balance, average precision and F1 saturate, while the Matthews correlation coefficient and negative predictive value expose unreliable normal predictions. Pixel-level maps further show that strong image-level separability does not imply spatial localization, and the diffusion module succeeds as a local density prior rather than through global geometric reasoning. These findings motivate sample-adaptive fusion and imbalance-aware evaluation of hybrid wafer anomaly detectors.
Machine Learning (cs.LG); Artificial Intelligence (cs.AI)
arXiv:2610.09993 [cs.LG]
(or arXiv:2610.09993v1 [cs.LG] for this version)
https://doi.org/10.48550/arXiv.2610.09993 Focus to learn more arXiv-issued DOI via DataCite (pending registration)
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