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DCM-SAM demonstrates a viable path for deploying adaptive vision models on edge NPUs by freezing large backbones and training only lightweight LoRA experts on synthetic data. The study critically highlights that standard quantization often fails to resolve activation overflow issues, necessitating specific architectural rewrites like attention mechanism adjustments to achieve full NPU utilization without CPU fallbacks. This approach offers a practical solution for real-time defect segmentation in manufacturing where labeled data is scarce and computational resources are strictly limited.
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DCM-SAM: Defect-Conditioned Mixture of LoRA Experts for NPU-Deployed AM Defect Segmentation

arXiv3 min read

arXiv:2609.38811v1 Announce Type: cross Abstract: Metal additive manufacturing parts are inspected by X-ray computed tomography, where labelled data is scarce, the pores and inclusions that matter span a few pixels, and inspection must happen at the machine. We present DCM-SAM, a defect-conditioned adaptive mixture of LoRA experts: one frozen Segment Anything backbone carries a separate Conv-LoRA expert bank and mask decoder per defect class, each trained in its own pass, without prompts, on synthetic slices alone, updating only 4.4% of the parameters. On benchmarks that XCT-SAM reports, DCM-SAM improves on every baseline for both classes from a ViT-B backbone against their ViT-H, and reaches 64.2% pore IoU on real NIST scans having seen no real images during training. Deployment then exposes what adaptation work rarely measures: on a Qualcomm Hexagon NPU, ViT-H and ViT-L compile yet cannot allocate at 1024x1024 image resolution, since activations rather than weights exceed the device ceiling, and quantizing weights does not help. ViT-B alone runs, but the adapted encoder then fails to allocate where the stock one succeeds, until a numerically identical rewrite of the attention lets the complete DCM-SAM run in FP16 at 1024x1024, with no operator falling back to the CPU, masks within 0.01% of pixels of the FP32 reference. Code: https://github.com/MushfiqShovon/DCM-SAM.

Abstract:Metal additive manufacturing parts are inspected by X-ray computed tomography, where labelled data is scarce, the pores and inclusions that matter span a few pixels, and inspection must happen at the machine. We present DCM-SAM, a defect-conditioned adaptive mixture of LoRA experts: one frozen Segment Anything backbone carries a separate Conv-LoRA expert bank and mask decoder per defect class, each trained in its own pass, without prompts, on synthetic slices alone, updating only 4.4% of the parameters. On benchmarks that XCT-SAM reports, DCM-SAM improves on every baseline for both classes from a ViT-B backbone against their ViT-H, and reaches 64.2% pore IoU on real NIST scans having seen no real images during training. Deployment then exposes what adaptation work rarely measures: on a Qualcomm Hexagon NPU, ViT-H and ViT-L compile yet cannot allocate at 1024x1024 image resolution, since activations rather than weights exceed the device ceiling, and quantizing weights does not help. ViT-B alone runs, but the adapted encoder then fails to allocate where the stock one succeeds, until a numerically identical rewrite of the attention lets the complete DCM-SAM run in FP16 at 1024x1024, with no operator falling back to the CPU, masks within 0.01% of pixels of the FP32 reference. Code: this https URL.

12 pages, 1 figure, 8 tables. Accepted at the NeurIPS 2026 Workshop on On-Device Intelligence: Foundation Models under Real-World Constraints (ODI)

Computer Vision and Pattern Recognition (cs.CV); Machine Learning (cs.LG)

arXiv:2609.38811 [cs.CV]

(or arXiv:2609.38811v1 [cs.CV] for this version)

https://doi.org/10.48550/arXiv.2609.38811 Focus to learn more arXiv-issued DOI via DataCite (pending registration)

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Full text under the publisher's open licence · 327 words

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