Beyond Layers: Position-Resolved Gradient Conflict and Position-Aware Modulation for Unified Multimodal Models

Abstract:Unified multimodal models (UMMs) train image understanding and autoregressive image generation on shared parameters, and the two objectives are known to interfere. Existing diagnoses and remedies operate at the resolution of layers or experts, measuring conflict per layer and resolving it by separating parameters. We argue that this resolution hides an orthogonal axis. Generation in a UMM is next-token prediction over a raster sequence of visual tokens whose roles vary systematically with position, so how strongly a generation gradient interferes with understanding should depend on where in the sequence it originates. We introduce a position-resolved interference map that attributes understanding-generation gradient conflict to visual-token positions within every layer, computed from a single backward pass at $1.2\times$ the cost of a standard backward pass. On Show-o and Janus-Pro, position explains a large share of conflict variance after controlling for depth (partial $\eta^2=0.31$ vs. $0.35$ for layer on Show-o; $0.15$ vs. $0.30$ on Janus-Pro): the first quarter of the sequence has a mean gradient cosine of $-0.18$ against understanding, the last quarter $-0.02$. The dependence survives per-position gradient-norm normalization, retaining $80%$ of its effect size, and conflict strength tracks semantic content (Spearman $\rho=0.64$). Building on the map, we propose position-aware modulation (PAM), which removes the anti-aligned component of generation gradients only at high-conflict positions without changing the architecture. Under a matched trainable-parameter budget, PAM improves over layer-wise separation by $+21$ MME and $+2.4$ GenEval points on Show-o while matching it on POPE and overall FID; a random-position control recovers about $31%$ of the gain. Position-based and layer-based separation are complementary degrees of freedom and can be combined.

20 pages, 10 figures, 6 tables. Code will be made publicly available upon acceptance

Computer Vision and Pattern Recognition (cs.CV); Machine Learning (cs.LG)

arXiv:2609.38485 [cs.CV]

(or arXiv:2609.38485v1 [cs.CV] for this version)

https://doi.org/10.48550/arXiv.2609.38485 Focus to learn more arXiv-issued DOI via DataCite (pending registration)

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