aiqbench analysis
This article presents 2D-FET-Bench V2, a novel benchmark evaluating language-model agents' ability to design field-effect transistor layouts on two-dimensional flakes using microscopy-derived contours. The study demonstrates that while current models can solve the majority of tasks with reasoning frameworks like ReAct-3, they still struggle with geometric consistency and expert-level validation in complex nanofabrication scenarios. This work bridges computer science and materials physics by establishing a rigorous testbed for AI-driven automation in quantum device manufacturing.
2d-fet-bench: from spatial reasoning to fet design on flakes
arXiv:2610.07423v1 Announce Type: new Abstract: Field-effect transistor (FET) layouts on exfoliated two-dimensional flakes are typically drawn by hand for each flake, placing contacts and gates to match its position and outline in optical micrographs. To our knowledge, no executable benchmark tests whether language-model agents can perform this flake-specific construction reliably. We introduce 2D-FET-Bench V2, a benchmark of 128 layout tasks built from microscopy-derived flake contours, including hole-containing flakes and multi-flake tasks. Each task supplies a textual device specification and contour coordinates. An agent generates typed polygon and path operations rendered to GDSII. A deterministic verifier checks geometric and structural requirements, and a separate integrity check verifies that the supplied contours remain unchanged. Scripted reference layouts pass all 128 tasks, showing that every task is solvable. We evaluate six models and seven workflow and scaffold variants of GPT5.6-Luna, with five attempts per task. The best-performing configuration in the six-model panel, GPT5.6-Luna with ReAct-3, passes 62.3% of attempts and solves 80.5% of tasks at least once (coverage) and 43.8% in all five attempts (consistency). ReAct-3 exceeds the one-pass Plan-and-Execute by 27.0 pass@1 points at 2.46 times the tokens. An expert audit of one sampled verifier-passing layout per covered task, across five ReAct-3 configurations, accepts 56.4% to 63.5% of them. The benchmark evaluates geometric and structural FET layout construction.
Abstract:Field-effect transistor (FET) layouts on exfoliated two-dimensional flakes are typically drawn by hand for each flake, placing contacts and gates to match its position and outline in optical micrographs. To our knowledge, no executable benchmark tests whether language-model agents can perform this flake-specific construction reliably. We introduce 2D-FET-Bench V2, a benchmark of 128 layout tasks built from microscopy-derived flake contours, including hole-containing flakes and multi-flake tasks. Each task supplies a textual device specification and contour coordinates. An agent generates typed polygon and path operations rendered to GDSII. A deterministic verifier checks geometric and structural requirements, and a separate integrity check verifies that the supplied contours remain unchanged. Scripted reference layouts pass all 128 tasks, showing that every task is solvable. We evaluate six models and seven workflow and scaffold variants of GPT5.6-Luna, with five attempts per task. The best-performing configuration in the six-model panel, GPT5.6-Luna with ReAct-3, passes 62.3% of attempts and solves 80.5% of tasks at least once (coverage) and 43.8% in all five attempts (consistency). ReAct-3 exceeds the one-pass Plan-and-Execute by 27.0 pass@1 points at 2.46 times the tokens. An expert audit of one sampled verifier-passing layout per covered task, across five ReAct-3 configurations, accepts 56.4% to 63.5% of them. The benchmark evaluates geometric and structural FET layout construction.
Artificial Intelligence (cs.AI); Mesoscale and Nanoscale Physics (cond-mat.mes-hall); Materials Science (cond-mat.mtrl-sci)
arXiv:2610.07423 [cs.AI]
(or arXiv:2610.07423v1 [cs.AI] for this version)
https://doi.org/10.48550/arXiv.2610.07423 Focus to learn more arXiv-issued DOI via DataCite (pending registration)
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