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This research demonstrates a scalable approach to quantum materials characterization by repurposing standard commercial CMOS processes into integrated platforms for multimodal sensing. By partitioning the metal stack within a 1 mm² footprint, the study enables cryogenic magnetic susceptibility measurements and NV-center ODMR without requiring custom hardware fabrication. This method significantly reduces power requirements while maintaining high sensitivity, offering a reproducible path forward for quantum instrumentation that avoids sample-specific manufacturing bottlenecks.
Foundry CMOS platform for multimodal quantum materials characterization
arXiv:2607.18059v1 Announce Type: cross Abstract: Quantum materials experiments increasingly rely on microwave, electrical, thermal, optical, and structural probes, but these capabilities are typically assembled from custom hardware that limits reproducibility and scalability. Here we show that a commercial 65-nm CMOS process can be repurposed as a passive, foundry-manufacturable characterization platform by functionally partitioning its metal stack into microwave, thermal, and electrical subsystems within a 1 mm2 footprint. The integrated RF architecture enables cryogenic magnetic susceptibility measurements of Fe3GeTe2 heterostructures at 1.75 K without sample-specific fabrication. We further demonstrate NV-center optically detected magnetic resonance (ODMR) with >20% contrast at 4-9 dBm microwave power, reducing power requirements by 20-25 dB relative to conventional antenna-based approaches while maintaining sensitivities of 2-3 uT/sqrt(Hz). We additionally confirm compatibility with in-situ electron-beam imaging, showing no measurable degradation in image quality upon device operation. These results establish a scalable, foundry-manufacturable platform for multimodal quantum sensing and materials characterization.
Abstract:Quantum materials experiments increasingly rely on microwave, electrical, thermal, optical, and structural probes, but these capabilities are typically assembled from custom hardware that limits reproducibility and scalability. Here we show that a commercial 65-nm CMOS process can be repurposed as a passive, foundry-manufacturable characterization platform by functionally partitioning its metal stack into microwave, thermal, and electrical subsystems within a 1 mm2 footprint. The integrated RF architecture enables cryogenic magnetic susceptibility measurements of Fe3GeTe2 heterostructures at 1.75 K without sample-specific fabrication. We further demonstrate NV-center optically detected magnetic resonance (ODMR) with >20% contrast at 4-9 dBm microwave power, reducing power requirements by 20-25 dB relative to conventional antenna-based approaches while maintaining sensitivities of 2-3 uT/sqrt(Hz). We additionally confirm compatibility with in-situ electron-beam imaging, showing no measurable degradation in image quality upon device operation. These results establish a scalable, foundry-manufacturable platform for multimodal quantum sensing and materials characterization.
Materials Science (cond-mat.mtrl-sci); Instrumentation and Detectors (physics.ins-det); Quantum Physics (quant-ph)
arXiv:2607.18059 [cond-mat.mtrl-sci]
(or arXiv:2607.18059v1 [cond-mat.mtrl-sci] for this version)
https://doi.org/10.48550/arXiv.2607.18059 arXiv-issued DOI via DataCite (pending registration)
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