analiza aiqbench
This research presents a novel on-chip thermometry platform using TiN kinetic inductance resonators to precisely monitor fast thermal fluctuations in cryogenic quantum processors. By achieving sub-millikelvin sensitivity and mapping quasi-ballistic heat propagation, the study addresses critical bottlenecks in managing non-equilibrium dynamics within high-performance quantum devices.
Fast On-Chip Thermometry with TiN Kinetic Inductance Resonators in 22 nm Process Technology
arXiv:2608.27057v1 Announce Type: new Abstract: Understanding the temporal and spatial dependence of temperature is critical in high-performance cryogenic devices. Typical thermometry techniques struggle to simultaneously combine high bandwidth, sensitivity and on-chip integration, limiting their ability to measure fast intra-device thermal fluctuations. Here, we demonstrate a time-resolved thermometry platform based on TiN kinetic inductance resonators integrated in a 22 nm FDSOI chip. By tracking temperature-dependent shifts in the resonant frequency, we achieve sub-millikelvin temperature sensitivity down to temperatures of 100 mK. Time-resolved on-chip pulsed heating experiments as a function of distance reveal an onset delay, consistent with a quasi-ballistic heat propagation velocity of 3.9 ${\pm}$ 0.1 mm ${\mu}$s${}^{-1}$. We also show that elevated temperatures increase net thermal conductance, shortening thermal relaxation times across all spatial separations. This behaviour manifests in two distinct regimes: a substrate-limited regime at 100 mK, where cooling rates vary with heater distance, and a Kapitza boundary-limited regime at 400 mK, where thermal relaxation becomes more spatially uniform.These measurements demonstrate kinetic inductance thermometry's ability to rapidly probe non-equilibrium temperature dynamics in cryogenic devices such as quantum processors.
Authors:Johann Drayne, George Ridgard, Lorenzo Peri, Frederic Schlattner, Fabio Olivieri, Mathieu de Kruijf, Isaac Harris, Grayson Noah, James Kirkman, Alberto Gomez-Saiz, M. Fernando Gonzalez-Zalba, Thomas Swift
Abstract:Understanding the temporal and spatial dependence of temperature is critical in high-performance cryogenic devices. Typical thermometry techniques struggle to simultaneously combine high bandwidth, sensitivity and on-chip integration, limiting their ability to measure fast intra-device thermal fluctuations. Here, we demonstrate a time-resolved thermometry platform based on TiN kinetic inductance resonators integrated in a 22 nm FDSOI chip. By tracking temperature-dependent shifts in the resonant frequency, we achieve sub-millikelvin temperature sensitivity down to temperatures of 100 mK. Time-resolved on-chip pulsed heating experiments as a function of distance reveal an onset delay, consistent with a quasi-ballistic heat propagation velocity of 3.9 ${\pm}$ 0.1 mm ${\mu}$s${}^{-1}$. We also show that elevated temperatures increase net thermal conductance, shortening thermal relaxation times across all spatial separations. This behaviour manifests in two distinct regimes: a substrate-limited regime at 100 mK, where cooling rates vary with heater distance, and a Kapitza boundary-limited regime at 400 mK, where thermal relaxation becomes more spatially this http URL measurements demonstrate kinetic inductance thermometry's ability to rapidly probe non-equilibrium temperature dynamics in cryogenic devices such as quantum processors.
Quantum Physics (quant-ph); Mesoscale and Nanoscale Physics (cond-mat.mes-hall)
arXiv:2608.27057 [quant-ph]
(or arXiv:2608.27057v1 [quant-ph] for this version)
https://doi.org/10.48550/arXiv.2608.27057 arXiv-issued DOI via DataCite (pending registration)
Text integral sub licența deschisă a publicației · 225 cuvinte
