3D traps now host ion crystals for quantum simulation and networking

Microfabricated three-dimensional ion traps are now achieving electric field depths in the electron volt range, a performance leap enabling more stable ion confinement for quantum technologies. These monolithic 3D traps, built with micron-level precision, feature segmented electrodes that facilitate and maintain low heating rates through larger ion-electrode distances. The fabrication process, using Translume Inc.’s femtoEtch process on fused silica, supports high voltages, over 450V peak to peak, and has been demonstrated with Yb+ ions, exhibiting heating rates of approximately 1 quanta per second. This platform offers robust operation and high photon collection efficiency, advancing the scalability of quantum…